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Specific Process Knowledge/Characterization/Drop Shape Analyzer: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=240  Drop Shape Analyzer in LabManager]
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=240  Drop Shape Analyzer in LabManager]


== Process information ==
==An overview of the performance of the Prism Coupler==


Link to process pages - e.g. one page for each material
{| border="2" cellspacing="0" cellpadding="10"
 
|-
Example:
!style="background:silver; color:black;" align="left"|Purpose
*[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using RIE1 or RIE2|Etch of silicon using RIE]]
|style="background:LightGrey; color:black"|Film thickness measurements and optical characterization of optically transparent thin films||style="background:WhiteSmoke; color:black"|
*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2|Etch of silicon oxide using RIE]]
*Measurement of film thickness
*[[Specific Process Knowledge/Etch/Etching of Silicon Nitride/Etch of Silicon Nitride using RIE|Etch of silicon nitride using RIE]]
*Optical constants
*[[Specific Process Knowledge/Etch/Etching of Polymer/Etch of Photo Resist using RIE|Etch of photo resist using RIE]]
|-
 
!style="background:silver; color:black" align="left"|Performance
==Equipment performance and process related parameters==
|style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"|
Film with a refractive index of less than 2.02 and that are transparent to the light in the given wavelength range
ex:
*Silicon Oxide
*Silicon nitride
*polymers
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Film thickness range
|style="background:WhiteSmoke; color:black"|
*~1µm to 15 µm
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Film thickness accuracy
|style="background:WhiteSmoke; color:black"|
*±(0.5%+50Å)
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Index accuracy
|style="background:WhiteSmoke; color:black"|
*±0.001
|-
!style="background:silver; color:black" align="left"|Process parameter range
|style="background:LightGrey; color:black"|Wavelength range
|style="background:WhiteSmoke; color:black"|
Can operate at two different wavelength:
*633 nm
*1550 nm
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
*One sample at a time - all sample larger than 5x5 mm<sup>2</sup>sizes up to 6"
|-
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
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