Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
Appearance
| Line 106: | Line 106: | ||
| style="background:LightGrey; color:black"|Substrate material allowed | | style="background:LightGrey; color:black"|Substrate material allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Silicon wafers ( | *Silicon wafers (RCA cleaned) | ||
*From A4 furnace directly (e.g. incl. Predep HF) | *From A4 furnace directly (e.g. incl. Predep HF) | ||
*In doubt: look at the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination | *In doubt: look at the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination information in LabManager] or please send a mail to [mailto:thinfilm@danchip.dtu.dk thinfilm@danchip.dtu.dk]. | ||
|- | |- | ||
|} | |} | ||