Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE: Difference between revisions
| Line 192: | Line 192: | ||
===Etch of nano sized structures=== | ===Etch of nano sized structures=== | ||
*See pxnano2 and comparison with nanotech on the Pegasus: [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2]] | |||
Older work: | |||
Three different examples of etch are shown here. The masking material was zep520A (80 nm). | Three different examples of etch are shown here. The masking material was zep520A (80 nm). | ||