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==QC template  - try to make you QC recipe + limits look as much as possible like this==
==Quality Control - Parameters and Limits==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Controle (QC) for RIE1 and RIE2'''
|bgcolor="#98FB98" |'''Quality Controle (QC) for RIE1 and RIE2'''
|-
|-
|
|
*[http://labmanager.danchip.dtu.dk/d4Show.php?id=1389&mach=18 The QC procedure for RIE1 and RIE2]<br>
*[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=2846&mach=47 The QC procedure for Boron Furnace A1]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?type=data&mach=18 The newest QC data for RIE1]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1987 The newest QC data for wet and dry oxide]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?type=data&mach=19 The newest QC data for RIE2]
 
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
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! QC Recipe:
! QC Recipe:
! OH_POLYA
! Wet1050
|-  
|-  
| SF<sub>6</sub> flow
| H<sub>2</sub> flow
|32 sccm
|3 sccm
|-
|-
|O<sub>2</sub> flow
|O<sub>2</sub> flow
|8 sccm
|2 sccm
|-  
|-  
|Pressure
|Temperature
|80 mTorr
|1050 C
|-
|-
|RF-power
|Oxidation time
|30 W
|30 min
|-
|Etch Load
|50%
|-
|-
|}
|}
| align="center" valign="top"|
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
!QC limits
!QC limits
!RIE1
!Wet1050
!RIE2
!Dry1050
|-
|-
|Etch rate in Si
|Thickness
|0.2 - 0.6 µm/min
|108-114 nm
|0.2 - 0.6 µm/min
|286-302 nm
|-
|-
|Non-uniformity
|Non-uniformity
|2 - 5 %
|3 %
|2 - 5 %
|5 %
|-
|-
|}
|}
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|}
|}
|}
|}


==Overview of the performance of the boron drive-in furnace and some process related parameters==
==Overview of the performance of the boron drive-in furnace and some process related parameters==