Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

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==Nanoman==
==Nanoman==


[[image:Dektak8.JPG|275x275px|right|thumb|Dektak8: positioned in cleanroom 4 - glass cage no. 4]]
[[image:Nanoman.jpg|275x275px|right|thumb|Nanoman: positioned in cleanroom 4 - glass cage no. 4]]


The AFM: Nanoman is a product of Veeco Instruments.  
The AFM: Nanoman is a product of Veeco Instruments.  

Revision as of 11:44, 8 January 2008

Nanoman

Nanoman: positioned in cleanroom 4 - glass cage no. 4

The AFM: Nanoman is a product of Veeco Instruments.

To get some product information from the vendor take a look at Veeco's homepage [1]

A rough overview of the performance of the AFM: Nanoman

Purpose Profiler for measuring micro structures.
  • Single point profiles
  • Wafer mapping
  • Stress measurements by measuring wafer bow
  • Surface roughness on a line scan
Performance Scan range xy

Line scan x: 50 µm to 200 mm

. Scan range z

50 Å to 262 µm

. Resolution xy

down to 0.067 µm

. Resolution z

1Å, 10Å or 20Å

. Max. scan depth as a function of trench width W

1.2(W[µm]-5µm)

Hardware settings Tip radius
  • 5 µm 45o cone
Substrates Substrate size
  • up to 8"
. Substrate material allowed
  • In principle all materials