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Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions

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![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]]
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]]
![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|Nanoman]]
![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|Nanoman]]
![[Specific Process Knowledge/Characterization/Profiler#Dektak III-V Profiler|Dektak III-V Profiler]]
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|3D Profiler for measuring micro structures. Can do wafer mapping.
|3D Profiler for measuring micro structures. Can do wafer mapping.
|AFM for measuring nanostructures and surface roughness
|AFM for measuring nanostructures and surface roughness
|Profiler for measuring micro structures.
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*Stitching: In principel a hole 6" wafer (time consuming)
*Stitching: In principel a hole 6" wafer (time consuming)
|90 µm square
|90 µm square
|Line scan x: 50-50000 µm
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*94.4µm ->9984µm
*94.4µm ->9984µm
|1 µm (can go up to 5 µm under special settings)
|1 µm (can go up to 5 µm under special settings)
|130 nm
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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*0.5µm -> 5µm
*0.5µm -> 5µm
|Depending on scan size and number of samples per line and number of lines - accuracy better than 2%
|Depending on scan size and number of samples per line and number of lines - accuracy better than 2%
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*Confocal (depending on objective): 1nm -> 50nm
*Confocal (depending on objective): 1nm -> 50nm
|<1Å - accuracy better than 2%
|<1Å - accuracy better than 2%
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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*Somewhere between 1:1 and 1:12
*Somewhere between 1:1 and 1:12
|~1:1 with standard cantilever.
|~1:1 with standard cantilever.
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*White broadband LED: 550nm
*White broadband LED: 550nm
|<12 nm on standard cantilever
|<12 nm on standard cantilever
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|Can be done
|Can be done
|No stress calculation capability
|No stress calculation capability
|Cannot be done
|Cannot be done
|Cannot be done
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|Can be done on a line or an area
|Can be done on a line or an area
|Can be done on a selected surface area  
|Can be done on a selected surface area  
|Recommended to use Dektak XTA or Dektak 8.
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|Up to more than 6"
|Up to more than 6"
|6" or less
|6" or less
|4" or less
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*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials
*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials
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*Almost any material that does not leave residual on the stage.
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