|
|
| Line 14: |
Line 14: |
|
| |
|
| ===Comparison of the two stylus profilers, the optical profiler and the AFM=== | | ===Comparison of the two stylus profilers, the optical profiler and the AFM=== |
| {| border="2" cellspacing="0" cellpadding="4" align="center"
| |
| !
| |
| ![[Specific Process Knowledge/Characterization/Profiler#Dektak_8_stylus_profiler|Dektak 8 stylus profiler]]
| |
| ![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA_new stylus profiler]]
| |
| ![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]]
| |
| ![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|Nanoman]]
| |
| |- valign="top"
| |
| |'''General description'''
| |
| |Profiler for measuring micro structures. Can do wafer mapping and stress measurements.
| |
| |Profiler for measuring micro structures. Can do wafer mapping and stress measurements.
| |
| |3D Profiler for measuring micro structures. Can do wafer mapping.
| |
| |AFM for measuring nanostructures and surface roughness
| |
| |-valign="top"
| |
| |'''Substrate size'''
| |
| |up to 8"
| |
| |up to 6"
| |
| |Up to more than 6"
| |
| |6" or less
| |
| |-valign="top"
| |
| |'''Max. scan range xy'''
| |
| |Line scan x: 50µm to 200mm
| |
| |Line scan x: 50µm to 55mm in one scan. Maximum scan lenght with stiching 200mm.
| |
| |Depending on the objective:
| |
| *One view: 127µmX95µm to 1270µmX955µm
| |
| *Stitching: In principel a hole 6" wafer (time consuming)
| |
| |90 µm square
| |
| |-valign="top"
| |
| |'''Max. scan range z'''
| |
| |50Å to 1mm
| |
| |50Å to 1mm
| |
| |Depending on the objective and Z resolution:
| |
| *94.4µm ->9984µm
| |
| |1 µm (can go up to 5 µm under special settings)
| |
| |-valign="top"
| |
| |'''Resolution xy'''
| |
| |down to 0.067 µm
| |
| |down to 0.003 µm
| |
| |Depending on the objective:
| |
| *0.5µm -> 5µm
| |
| |Depending on scan size and number of samples per line and number of lines - accuracy better than 2%
| |
| |-valign="top"
| |
| |'''Resolution z'''
| |
| |1Å, 10Å, 40Å or 160Å
| |
| |1Å, 10Å, 80Å or 160Å
| |
| |Depending on measuring methode:
| |
| *PSI down to 0.01 nm
| |
| *VSI down to 1 nm
| |
| *Confocal (depending on objective): 1nm -> 50nm
| |
| |<1Å - accuracy better than 2%
| |
| |- valign="top"
| |
| |'''Max. scan depth [µm] (as a function of trench width W''')
| |
| |1.2*(W[µm]-5µm)
| |
| |1.2*(W[µm]-5µm)
| |
| |Depending on material and trench width:
| |
| *Somewhere between 1:1 and 1:12
| |
| |~1:1 with standard cantilever.
| |
| |-valign="top"
| |
| |'''Tip radius'''
| |
| |5 µm 45<sup>o</sup> cone
| |
| |5 µm 45<sup>o</sup> cone
| |
| |No tip - using light
| |
| *Blue monochromatic LED: 460nm
| |
| *White broadband LED: 550nm
| |
| |<12 nm on standard cantilever
| |
| |-valign="top"
| |
| |'''Stress measurement'''
| |
| |Can be done
| |
| |Can be done
| |
| |No stress calculation capability
| |
| |Cannot be done
| |
| |-valign="top"
| |
| |'''Surface roughness'''
| |
| |Can be done on a line scan
| |
| |Can be done on a line scan
| |
| |Can be done on a line or an area
| |
| |Can be done on a selected surface area
| |
| |-
| |
| |}
| |
|
| |
|
| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | | {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" |
