Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
No edit summary |
|||
| Line 10: | Line 10: | ||
At moment there is only a standard recipe for deposition of silicon rich nitride (SRN) on 4" wafers on the 4" nitride furnace. On the 6" nitride furnace there are two standard recipes for deposition of stoichiometric nitride (Si<sub>3</sub>N<sub>4</sub>), one for 4" wafers and one for 6" wafers. | At moment there is only a standard recipe for deposition of silicon rich nitride (SRN) on 4" wafers on the 4" nitride furnace. On the 6" nitride furnace there are two standard recipes for deposition of stoichiometric nitride (Si<sub>3</sub>N<sub>4</sub>), one for 4" wafers and one for 6" wafers. | ||
'''The user | '''The user manuals, quality control procedures and results, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=84 LPCVD Nitride 100 mm furnace (B2)]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=84 LPCVD Nitride 100 mm furnace (B2)]''' | ||