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Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions

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*Nanoman - ''AFM for measuring nano structures''
*Nanoman - ''AFM for measuring nano structures''


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High Aspect ratio structures


The fact that the tip is shaped like a cone with some tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 <math>\mu</math>m wide trench is etched deeper than approximately 24 <math>\mu</math>m, the tip of the Dektak will not be able to
===High Aspect ratio structures===
 
The fact that the tip is shaped like a cone with some tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 <math>\mu</math>m wide trench is etched deeper than approximately 18 <math>\mu</math>m, the tip of the Dektak will not be able to reach the bottom.