Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 6: | Line 6: | ||
*Nanoman - ''AFM for measuring nano structures'' | *Nanoman - ''AFM for measuring nano structures'' | ||
{| border=" | |||
{| border="2" cellspacing="0" cellpadding="4" align="center" | |||
! | ! | ||
!Tencor | !Tencor | ||
| Line 64: | Line 65: | ||
|} | |} | ||
The fact that the tip is shaped like a cone with some tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 <math>\mu</math>m wide trench is etched deeper than approximately | ===High Aspect ratio structures=== | ||
The fact that the tip is shaped like a cone with some tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 <math>\mu</math>m wide trench is etched deeper than approximately 18 <math>\mu</math>m, the tip of the Dektak will not be able to reach the bottom. | |||