Specific Process Knowledge/Etch/Etching of SU-8: Difference between revisions
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* High anisotropic etch: etch rate ~400nm/min, anisotropy ~0.8 | * High anisotropic etch: etch rate ~400nm/min, anisotropy ~0.8 | ||
* Low anisotropic etch: etch rate ~ | * Low anisotropic etch: etch rate ~170nm/min, anisotropy ~0.3 | ||
==Recipes in ASE== | ==Recipes in ASE== | ||