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Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,329 edits
Line 58: Line 58:
(Sensofar)
(Sensofar)
|Scanning electron microscope  
|Scanning electron microscope  
([[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM-Zeiss]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/LEO|SEM-LEO]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/FEI|SEM-FEI]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Jeol|SEM-JEOL]])
([[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM Supra 60VP]],
([[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM Supra 40VP]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/LEO|SEM-LEO]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/FEI|SEM-FEI]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Jeol|SEM-JEOL]])
|Atomic force microscope  
|Atomic force microscope  
(NanoMan)
(NanoMan)
|Stylus profiler  
|Stylus profiler  
(Dektak 8, Dektak XTA, III-V profiler)
(Dektak 8, Dektak XTA)
|-
|-


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|Light
|Light
|Light
|Light
|Electrons
|
|Forces
*Secondary electrons
*Backscattered electrons
|Atomic forces between tip and sample surface
|Contact  
|Contact  
|-
|-
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