Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
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![[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy|SEM]] | ![[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy|SEM]] | ||
![[Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy|AFM]] | ![[Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy|AFM]] | ||
![[Specific_Process_Knowledge/Characterization/Profiler#Dektak_XTA_new_stylus_profiler|Stylus profiler | ![[Specific_Process_Knowledge/Characterization/Profiler#Dektak_XTA_new_stylus_profiler|Stylus profiler]] | ||
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(NanoMan) | (NanoMan) | ||
|Stylus profiler | |Stylus profiler | ||
(Dektak 8, Dektak XTA) | (Dektak 8, Dektak XTA, III-V profiler) | ||
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|Cofocal measurements: | |Cofocal measurements: | ||
10x objective: <50 nm | *10x objective: <50 nm | ||
50x objective, NA 0.95: <1 nm | *50x objective, NA 0.95: <1 nm | ||
Interference measurements: | Interference measurements: | ||
PSI: 0.01 nm | *PSI: 0.01 nm | ||
VSI: 1 nm | *VSI: 1 nm | ||
|1-20 nm | |1-20 nm | ||
Depends on what SEM you use | |||
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|Three times pixel-to-pixel distance: | |Three times pixel-to-pixel distance: | ||
10x objective: 4.95 &mu | *10x objective: 4.95 &mu | ||
100x objective: 0.495 &mu | *100x objective: 0.495 &mu | ||
|1-20 nm | |1-20 nm | ||
Depends on what SEM you use | |||
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