Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
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The optical microscopes provide fast and easy information about most samples without sample preparation. The resolution is limited by the objectives and wavelenght of the light. Also the depth of focus is limited, especially for higher magnifications. | The optical microscopes provide fast and easy information about most samples without sample preparation. The resolution is limited by the objectives and wavelenght of the light. Also the depth of focus is limited, especially for higher magnifications. | ||
The main purpose of the optical profiler is a obtain 3D images of different samples and to measure surface roughtness or step heights, also for structures with high aspect ratio. Two different types of measurements can be done - confocal and interference (phase shift and vertical scanning interference) measurements. It is possible to measurement hight aspect ratio structures. The resolution is limited by the objectives and the pixel size on the screen. | |||
The SEMs are used for inspection of different sample. The resolution is very good - It is possible to obtaion good images of strucures smaller then 100 nm with all SEMs in the cleanroom. Samples can either flat or tilted. | |||
The | |||
The optical profiler provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), VSI (Vertical Scanning Interferometry) and high resolution thin film thickness measurement on a single instrument. The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus method, roughness measurements with larger FOV than the AFM, but less horisontal resolution. | The optical profiler provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), VSI (Vertical Scanning Interferometry) and high resolution thin film thickness measurement on a single instrument. The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus method, roughness measurements with larger FOV than the AFM, but less horisontal resolution. | ||
The AFM is used for inspection of nanoscale structures and for surface roughness measurements. The vertical resolution is very good. The horizontal resolution is limited by the tip, but it is possible to bye special tips for high aspect ratio structures. The scan speed is slow, and the field of view is very limited, so it is only possible to get information about a small area of the sample. | |||
The AFM is used | |||
The Dektak is is stylus profiler. A step height measurement can be done very fast in a line scan. The vertical resolution is very good, but the horizontal resolution and the aspect ratio you can measure are limited by the tip. Stres measurements can also be done with the Dektak. | |||
The Dektak is | |||