Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/nanoetch/211nmzep: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano/nanoetch/ | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano/nanoetch/211nmzep click here]''' | ||
<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> | <gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> |
Revision as of 11:13, 22 October 2013
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The 30 nm zep profile
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The 60 nm zep profile
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The 90 nm zep profile
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The 120 nm zep profile
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The 150 nm zep profile