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Specific Process Knowledge/Etch: Difference between revisions

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*[[/Wet Gold Etch|Wet Gold Etch]]
*[[/Wet Gold Etch|Wet Gold Etch]]
*[[/Wet Platinum Etch|Wet Platinum Etch]]
*[[/Wet Platinum Etch|Wet Platinum Etch]]
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=  Section under construction [[Image:section under construction.jpg|70px]] =
{| {{table}}
| align="left" valign="top"  style="background:LightGray"|''' Dielectrica'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Semicondutors'''
| align="left" valign="top" style="background:LightGray"|''' Metals'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Alloys'''
| align="left" valign="top" style="background:LightGray"|''' Polymers'''
|-valign="top"
|style="background: LightGray"|
[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/>
[[/Deposition of Titanium Oxide|Titanium Oxide]]<br/>
|style="background: #DCDCDC"|
[[/Deposition of Silicon|Silicon]]
|style="background: LightGray"|
[[/Deposition of Aluminium|Aluminium]] <br/>
[[/Deposition of Titanium|Titanium]]<br/>
[[/Deposition of Chromium|Chromium]]<br/>
[[/Deposition of Nickel|Nickel]]<br/>
[[/Deposition of Copper|Copper]]<br/>
[[/Deposition of Germanium|Germanium]]<br/>
[[/Deposition of Molybdenum|Molybdenum]]<br/>
[[/Deposition of Palladium|Palladium]]<br/>
[[/Deposition of Silver|Silver]]<br/>
[[/Deposition of Tin|Tin]]<br/>
[[/Deposition of Tantalum|Tantalum]]<br/>
[[/Deposition of Tungsten|Tungsten]]<br/>
[[/Deposition of Platinum|Platinum]]<br/>
[[/Deposition of Gold|Gold]]<br/>
|style="background: #DCDCDC"|
[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/>
[[/Deposition of NiCr|NiCr]] alloy  <br/>
[[/Deposition of AlTi|AlTi]] alloy
|style="background: LightGray"|
[[Specific Process Knowledge/Photolithography/SU8|SU8]]<br/>
Antistiction coating <br/>
Topas <br/>
PMMA
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