Specific Process Knowledge/Thin film deposition: Difference between revisions
Appearance
| Line 96: | Line 96: | ||
{| {{table}} | {| {{table}} | ||
| align="left" valign="top" style="background:LightGray"|''' Dielectrica''' | | align="left" valign="top" style="background:LightGray"|''' Dielectrica''' | ||
| align="left" valign="top" style="background:# | | align="left" valign="top" style="background:#DCDCDC;"|''' Semicondutors''' | ||
| align="left" valign="top" style="background:LightGray"|''' Metals''' | | align="left" valign="top" style="background:LightGray"|''' Metals''' | ||
| align="left" valign="top" style="background:# | | align="left" valign="top" style="background:#DCDCDC;"|''' Alloys''' | ||
| align="left" valign="top" style="background:LightGray"|''' Polymers''' | | align="left" valign="top" style="background:LightGray"|''' Polymers''' | ||
|-valign="top" | |-valign="top" | ||
| Line 105: | Line 105: | ||
[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/> | [[/Deposition of Silicon Oxide|Silicon Oxide]]<br/> | ||
[[/Deposition of Titanium Oxide|Titanium Oxide]]<br/> | [[/Deposition of Titanium Oxide|Titanium Oxide]]<br/> | ||
| | |style="background: #DCDCDC"| | ||
[[/Deposition of Silicon|Silicon]] | [[/Deposition of Silicon|Silicon]] | ||
|style="background: LightGray"| | |style="background: LightGray"| | ||
| Line 122: | Line 122: | ||
[[/Deposition of Platinum|Platinum]]<br/> | [[/Deposition of Platinum|Platinum]]<br/> | ||
[[/Deposition of Gold|Gold]]<br/> | [[/Deposition of Gold|Gold]]<br/> | ||
| | |style="background: #DCDCDC"| | ||
[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/> | [[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/> | ||
[[/Deposition of NiCr|NiCr]] alloy <br/> | [[/Deposition of NiCr|NiCr]] alloy <br/> | ||