Specific Process Knowledge/Thin film deposition: Difference between revisions
| Line 95: | Line 95: | ||
{| {{table}} | {| {{table}} | ||
| align=" | | align="left" valign="top" style="background:#f0f0f0;"|''' Dielectrica''' | ||
| align=" | | align="left" valign="top" style="background:#f0f0f0;"|''' Semicondutors''' | ||
| align=" | | align="left" valign="top" style="background:#f0f0f0;"|''' Metals''' | ||
| align=" | | align="left" valign="top" style="background:#f0f0f0;"|''' Alloys''' | ||
| align=" | | align="left" valign="top" style="background:#f0f0f0;"|''' Polymers''' | ||
|- | |-valign="top" | ||
| | | | ||
*[[/Deposition of Silicon Nitride|Silicon Nitride]] - '' | *[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' | ||
*[[/Deposition of Silicon Oxide|Silicon Oxide]] | *[[/Deposition of Silicon Oxide|Silicon Oxide]] | ||
*[[/Deposition of Titanium Oxide|Titanium Oxide]] | *[[/Deposition of Titanium Oxide|Titanium Oxide]] | ||