Specific Process Knowledge/Thin film deposition: Difference between revisions
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==Dielectrica== | ===Dielectrica=== | ||
*[[Specific Process Knowledge/Lithography/Pretreatment#HMDS|HMDS]] | *[[Specific Process Knowledge/Lithography/Pretreatment#HMDS|HMDS]] | ||
*[[Specific Process Knowledge/Lithography/Pretreatment#BHF|BHF]] | *[[Specific Process Knowledge/Lithography/Pretreatment#BHF|BHF]] | ||
*[[Specific Process Knowledge/Lithography/Pretreatment#250_C_oven_for_pretreatment|250C Oven for Pretreatment]] | *[[Specific Process Knowledge/Lithography/Pretreatment#250_C_oven_for_pretreatment|250C Oven for Pretreatment]] | ||
*[[Specific Process Knowledge/Lithography/Coaters#SSE Spinner|SSE Spinner]] | *[[Specific Process Knowledge/Lithography/Coaters#SSE Spinner|SSE Spinner]] | ||
*[[Specific Process Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | *[[Specific Process Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||
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*[[Specific Process Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | *[[Specific Process Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | *[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | *[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner-6inch]] | *[[Specific Process Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner-6inch]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#III-V Aligner|III-V Aligner]] | *[[Specific Process Knowledge/Lithography/UVExposure#III-V Aligner|III-V Aligner]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | *[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | ||
*[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | *[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | ||
*[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | *[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | ||
*[[Specific Process Knowledge/Lithography/Development#Automatic Developer Bench for 4" and 6"|Developer Bench]] | *[[Specific Process Knowledge/Lithography/Development#Automatic Developer Bench for 4" and 6"|Developer Bench]] | ||
*[[Specific Process Knowledge/Lithography/Strip#Plasma Asher 1|Plasma Asher 1]] | *[[Specific Process Knowledge/Lithography/Strip#Plasma Asher 1|Plasma Asher 1]] | ||
*[[Specific Process Knowledge/Lithography/Strip#Plasma Asher 2|Plasma Asher 2]] | *[[Specific Process Knowledge/Lithography/Strip#Plasma Asher 2|Plasma Asher 2]] | ||
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*[[Specific Process Knowledge/Lithography/Strip#Fine Acetone Strip|Fine Acetone Strip]] | *[[Specific Process Knowledge/Lithography/Strip#Fine Acetone Strip|Fine Acetone Strip]] | ||
*[[Specific Process Knowledge/Lithography/LiftOff#LiftOffWetBench|Lift-off Wet Bench]] | *[[Specific Process Knowledge/Lithography/LiftOff#LiftOffWetBench|Lift-off Wet Bench]] | ||
*[[Specific Process Knowledge/Lithography/LiftOff#LiftOff(4",6")|Lift-off (4", 6")]] | *[[Specific Process Knowledge/Lithography/LiftOff#LiftOff(4",6")|Lift-off (4", 6")]] | ||
*[[Specific Process Knowledge/Lithography/WaferCleaning#Spindryers|Spin dryers]] | *[[Specific Process Knowledge/Lithography/WaferCleaning#Spindryers|Spin dryers]] | ||
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==Semiconductors== | ===Semiconductors=== | ||
*[[Specific Process Knowledge/Lithography/DUVStepper#SÜSS Spinner-Stepper|SÜSS Spinner-Stepper]] | *[[Specific Process Knowledge/Lithography/DUVStepper#SÜSS Spinner-Stepper|SÜSS Spinner-Stepper]] | ||
*[[Specific Process Knowledge/Lithography/DUVStepper#Process information|Process information]] | *[[Specific Process Knowledge/Lithography/DUVStepper#Process information|Process information]] | ||
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*[[Specific Process Knowledge/Lithography/DUVStepper#Process information|Process information]] | *[[Specific Process Knowledge/Lithography/DUVStepper#Process information|Process information]] | ||
*[[Specific Process Knowledge/Lithography/DUVStepper#Overview of performance|Overview of performance]] | *[[Specific Process Knowledge/Lithography/DUVStepper#Overview of performance|Overview of performance]] | ||
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==Metals== | ===Metals=== | ||
*[[Specific Process Knowledge/Lithography/EBeamLithography#Performance of the e-beam writer|Performance]] | *[[Specific Process Knowledge/Lithography/EBeamLithography#Performance of the e-beam writer|Performance]] | ||
*[[Specific Process Knowledge/Lithography/EBeamLithography#Getting started|Getting started]] | *[[Specific Process Knowledge/Lithography/EBeamLithography#Getting started|Getting started]] | ||
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*[[Specific Process Knowledge/Lithography/EBeamLithography#Proximity Error Correction|Proximity Error Correction]] | *[[Specific Process Knowledge/Lithography/EBeamLithography#Proximity Error Correction|Proximity Error Correction]] | ||
*[[Specific Process Knowledge/Lithography/EBeamLithography#Charging of non-conductive substrates|Charging of non-conductive substrates]] | *[[Specific Process Knowledge/Lithography/EBeamLithography#Charging of non-conductive substrates|Charging of non-conductive substrates]] | ||
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==Alloys== | ===Alloys=== | ||
*[[Specific Process Knowledge/Lithography/NanoImprintLithography#Molecular Vapour Deposition|Molecular Vapour Deposition]] | *[[Specific Process Knowledge/Lithography/NanoImprintLithography#Molecular Vapour Deposition|Molecular Vapour Deposition]] | ||
*[[Specific Process Knowledge/Lithography/NanoImprintLithography#ObducatNIL|Obducat NIL]] | *[[Specific Process Knowledge/Lithography/NanoImprintLithography#ObducatNIL|Obducat NIL]] | ||
*[[Specific Process Knowledge/Lithography/NanoImprintLithography#EVG NIL|EVG NIL]] | *[[Specific Process Knowledge/Lithography/NanoImprintLithography#EVG NIL|EVG NIL]] | ||
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==Polymers== | ===Polymers=== | ||
*[[Specific Process Knowledge/Lithography/3DLithography#2-Photon Polymerization|2-Photon Polymerization]] | *[[Specific Process Knowledge/Lithography/3DLithography#2-Photon Polymerization|2-Photon Polymerization]] | ||
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