Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
No edit summary |
|||
| Line 14: | Line 14: | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=84 LPCVD Nitride 100 mm furnace (B2)]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=84 LPCVD Nitride 100 mm furnace (B2)]''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=250 LPCVD Nitride 150 mm furnace ( | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=250 LPCVD Nitride 150 mm furnace (E3)]''' | ||
==Process Knowledge== | ==Process Knowledge== | ||