Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
Appearance
No edit summary |
|||
| Line 8: | Line 8: | ||
The new [[/FEI|FEI SEM]] is our most advanced SEM. It has been acquired to cope with the growing need for polymer and e-beam related imaging. It is a state-of-the-art microscope with two vacuum modes (High Vacuum and Low Vacuum) and 7 different detectors, offering unsurpassed resolution on any type of sample or material. This great performance, however, requires a skilled operator that knows how to achieve it. Also, we have learned that the high degree of sophistication and the great number of detectors make it much less robust compared to the two other SEM's. It is therefore intended to be a superuser instrument where a fewer number of users will be trained. | The new [[/FEI|FEI SEM]] is our most advanced SEM. It has been acquired to cope with the growing need for polymer and e-beam related imaging. It is a state-of-the-art microscope with two vacuum modes (High Vacuum and Low Vacuum) and 7 different detectors, offering unsurpassed resolution on any type of sample or material. This great performance, however, requires a skilled operator that knows how to achieve it. Also, we have learned that the high degree of sophistication and the great number of detectors make it much less robust compared to the two other SEM's. It is therefore intended to be a superuser instrument where a fewer number of users will be trained. | ||
{| border="2" cellspacing="0" cellpadding="4" align="center" | |||
! | |||
!SEM - FEI | |||
!SEM - Leo | |||
!SEM - Jeol | |||
|- | |||
|Model | |||
|FEI Nova 600 NanoSEM | |||
|Leo 1550 SEM | |||
|Jeol JSM 5500 LV SEM | |||
|- | |||
| | |||
| | |||
| | |||
|- | |||
|Substrate size | |||
|Up to 6" with full view | |||
|Up to 6" with 4" full view | |||
|Up to 4" with full view | |||
|- | |||
| | |||
| | |||
| | |||
| | |||
|- | |||
|Max. scan range z | |||
|<100Å to~0.3mm | |||
|50Å to 262µm | |||
|1 µm (can go up to 5 µm under special settings) | |||
|- | |||
|Lateral resolution | |||
| | |||
| | |||
| | |||
|- | |||
|General availability | |||
|Good | |||
|Poor | |||
|Excellent | |||
|- | |||
|Ease of use | |||
| | |||
| | |||
| | |||
|- | |||
|Best usage | |||
|High resolution imaging of any sample | |||
|High resolution imaging of any non-polymer sample | |||
|Fast in-process imaging | |||
|} | |||