Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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|style="background:LightGrey; color:black"|HMDS contact angle | |style="background:LightGrey; color:black"|HMDS contact angle | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
60° - 90° (on SiO2) | 60° - 90°; standard recipe 82° (on SiO2) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameters | ||