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Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions

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| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
*Silicon (with oxide, nitride, or metal films or patterning)
*Any standard cleanroom material
*Glass (borosilicate and quartz)
*III-V materials
|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch
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