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Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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'''Feedback to this page''': '''[mailto:wetchemistry@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Silicon_Nitride_Etch click here]'''
==RCA cleaning==
==RCA cleaning==
[[Image:RCA-bænk_RR2_0.JPG|300x300px|thumb|RCA bench: positioned in cleanroom 2. <br /> RCA1 - RCA2 - HF - BHF(pre-dep wafers)]]
[[Image:RCA-bænk_RR2_0.JPG|300x300px|thumb|RCA bench: positioned in cleanroom 2. <br /> RCA1 - RCA2 - HF - BHF(pre-dep wafers)]]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Wafer_cleaning/RCA"