Specific Process Knowledge/Lithography: Difference between revisions
| Line 52: | Line 52: | ||
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*UV sensitive: | *UV sensitive: | ||
**AZ | **AZ5214E, AZ4562 | ||
**AZ MiR 701, AZ nLOF 2020 | |||
**SU-8 | **SU-8 | ||
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| Line 74: | Line 75: | ||
!Resist thickness range | !Resist thickness range | ||
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*~0.5µm to 20µm | *~0.5µm to 20µm | ||
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*~50nm to 2µm? | *~50nm to 2µm? | ||
| Line 134: | Line 135: | ||
!'''Allowed materials''' | !'''Allowed materials''' | ||
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* | *Si, SiO2, SOI, quartz, pyrex, III-V materials | ||
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*Allowed material 1 | *Allowed material 1 | ||