Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 156: | Line 156: | ||
|Positive | |Positive | ||
|ZEON | |ZEON | ||
|Low dose to clear | |Not approved and not yet purchased. Low dose to clear, can be used for trilayer (PEC-free) resist-stack. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information. | ||
|[[media:ZEP7000.pdf|ZEP7000.pdf]] | |[[media:ZEP7000.pdf|ZEP7000.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||