Specific Process Knowledge/Etch/Wet Platinum Etch: Difference between revisions
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Ething of Platinum can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. | Ething of Platinum can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. | ||
[[Image:Stinkskab RR2.jpg |300x300px|thumb|Wet Platinum Etch can be done in the fumehood positioned in cleanroom 2]] | |||
Platinum can be etched by the following wet etch: | Platinum can be etched by the following wet etch: | ||
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At this moment we do not have any information on the etch rate. You should be aware that this wet etch will also etch gold and it is not possible to use any masking material, it is used as a stripper. | At this moment we do not have any information on the etch rate. You should be aware that this wet etch will also etch gold and it is not possible to use any masking material, it is used as a stripper. | ||
Wet etching of Platinum is done by making your own setup in a glass beaker in the fumehood in cleanroom 2. Write content on the beaker and which metals has been etched with yellow permanent pen. You can see the APV [http://labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 here]. | |||
Write content on beaker and which metals has been etched with yellow permanent pen. | |||
===Platinum Etch data=== | ===Platinum Etch data=== | ||