Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
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It is especially good for thin films in the thickness range of a few nanometers to a few microns. The layer should be transparent to light in the usable wavelength range for the thickness to be determined. Large roughness (>40nm) and features within the field of view can cause the measurement to fail. | It is especially good for thin films in the thickness range of a few nanometers to a few microns. The layer should be transparent to light in the usable wavelength range for the thickness to be determined. Large roughness (>40nm) and features within the field of view can cause the measurement to fail. | ||
Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. | Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. To learn more about ellipsometry you can take a look at the [http://www.jawoollam.com/tutorial_1.html tutorial] provided by the J. A. Woollam Co. | ||
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