Specific Process Knowledge/Lithography: Difference between revisions
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?-? pr. ? | ?-? pr. ? | ||
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Depends on dose, Q [µC/cm2], beam current, I [A], and pattern area, A [cm2]: t = Q*A/I | Depends on dose, Q [µC/cm2], beam current, I [A], and pattern area, A [cm2]: t = Q*A/I | ||
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? pr. wafer | ? pr. wafer | ||