Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Au etch: Difference between revisions
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==IBE Au etch with Ti mask [[Image:section under construction.jpg|70px]] == | ==IBE Au etch with Ti mask [[Image:section under construction.jpg|70px]] == | ||
''by bge@danchip.dtu.dk'' | |||
Work has been started to find a good process for etching gold with a Titanium mask with high selektivity. | Work has been started to find a good process for etching gold with a Titanium mask with high selektivity. | ||
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!Generel description | !Generel description | ||
| | |This recipe has a good selectivity between ZEP520A resist and Ti, which makes it good for pattering the Ti that should be used as masking layer for the Au etch. It can also be used to for Au etch if the selektivity to the mask is good enough | ||
| | |This recipe has especially good selectivity between Ti and Au which makes it good for gold etching using a thin Ti mask as masking layer. The selectivity to resist is very bad so do not use it with a resist mask. | ||
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