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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Au etch: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Method 1]]
![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Ti etch test with Zep520A as mask - To etch the Ti mask]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Method 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Au etch test with high selectivity to Ti]]
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