Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 191: | Line 191: | ||
|AllResist | |AllResist | ||
|Approved, not tested yet. Should work similar to ZEP520A. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information. | |Approved, not tested yet. Should work similar to ZEP520A. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information. | ||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]] | |[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|X AR 600-54/6, MIBK:IPA | |X AR 600-54/6, MIBK:IPA | ||