Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|Go to top of this page]]</span> | <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|Go to top of this page]]</span> | ||
To request for an e-beam training session, contact | To request for an e-beam training session, contact [mailto:e-beam@danchip.dtu.dk e-beam@danchip.dtu.dk]; a DTU Danchip personnel will hereafter provide a time slot. Users require at least 4 training sessions before being allowed full acccess to the machine. | ||
For safety reasons, even fully trained users are only authorizedd to mount substrates into the e-beam cassettes, but not authorized to load the cassettes into the autoloader. | For safety reasons, even fully trained users are only authorizedd to mount substrates into the e-beam cassettes, but not authorized to load the cassettes into the autoloader. | ||