Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Leo|SEM Leo]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Zeiss|SEM Zeiss]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Supra60VP|SEM Supra 60VP]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/FEI|SEM FEI]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/ | |style="background:WhiteSmoke; color:black" align="center"|[[/Jeol|SEM Jeol]] | ||
|style="background:WhiteSmoke; color:black" align="center"|[[/Jeol|Jeol | |||
|- | |- | ||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Model | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Model | ||
|style="background:WhiteSmoke; color:black" align="center"| Leo 1550 SEM | |style="background:WhiteSmoke; color:black" align="center"| Leo 1550 SEM | ||
|style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 40 VP | |style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 40 VP | ||
|style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 60 VP | |||
|style="background:WhiteSmoke; color:black" align="center"| FEI Nova 600 NanoSEM | |style="background:WhiteSmoke; color:black" align="center"| FEI Nova 600 NanoSEM | ||
|style="background:WhiteSmoke; color:black" align="center"| Jeol JSM 5500 LV | |style="background:WhiteSmoke; color:black" align="center"| Jeol JSM 5500 LV | ||
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* Any sample except bulk insulators such as polymers, glass or quartz wafers | * Any sample except bulk insulators such as polymers, glass or quartz wafers | ||
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* Any sample except bulk insulators such as polymers, glass or quartz wafers TEST | |||
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* All samples | * All samples | ||
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* ~ 5 nanometers (limited by vibrations) | * ~ 5 nanometers (limited by vibrations) | ||
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* 1-2 nm (limited by vibrations) | |||
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* 1-2 nm (limited by vibrations) | * 1-2 nm (limited by vibrations) | ||
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* Inlens secondary electron (Inlens) | * Inlens secondary electron (Inlens) | ||
* Backscatter electron (QBSD) | * Backscatter electron (QBSD) | ||
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* Secondary electron (Se2) | |||
* Inlens secondary electron (Inlens) | |||
* Backscatter electron (QBSD) | |||
* Variable pressure secondary electron (VPSE) | |||
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* Secondary electron (Se2) | * Secondary electron (Se2) | ||
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* R: 360<sup>o</sup> | * R: 360<sup>o</sup> | ||
* Z: 50 mm | * Z: 50 mm | ||
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* X, Y: 150 × 150 mm | |||
* T: -10 to 70<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: XXX mm | |||
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* X, Y: 150 × 150 mm | * X, Y: 150 × 150 mm | ||
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|style="background:LightGrey; color:black"|Electron source | |style="background:LightGrey; color:black"|Electron source | ||
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* FEG (Field Emission Gun) source | |||
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* FEG (Field Emission Gun) source | * FEG (Field Emission Gun) source | ||
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* Fixed at High vacuum (2 × 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar) | * Fixed at High vacuum (2 × 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar) | ||
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* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | |||
* Variable at Low vacuum (0.1 mbar-2 mbar) | |||
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* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | * Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | ||
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* Up to 6" wafer with full view | * Up to 6" wafer with full view | ||
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* Up to 8" wafer with 6" view | |||
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* Up to 6" wafer with full view | * Up to 6" wafer with full view | ||
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|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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* Any standard cleanroom material except graphene or CNT samples | |||
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* Any standard cleanroom material except graphene or CNT samples | * Any standard cleanroom material except graphene or CNT samples | ||