Jump to content

Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

Kabi (talk | contribs)
Kabi (talk | contribs)
Line 242: Line 242:
|style="background:LightGrey; color:black"|Chemical solution
|style="background:LightGrey; color:black"|Chemical solution
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*28 wt% mixed in the ratio
*BHF 12%HF with Ammoniumflouride
KOH:H<sub>2</sub>O - 500 g : 1000 ml
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*28 wt% mixed in the ratio
*5% HF
KOH:H<sub>2</sub>O - 500 g : 1000 ml
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*28 wt% mixed in the ratio
*40% HF
KOH:H<sub>2</sub>O:IPA - 500 g : 1000 ml : ?? ml
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Custom made
*SiO etch
|-
|-
|style="background:LightGrey; color:black"|Temperature
|style="background:LightGrey; color:black"|Temperature