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Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
Line 146: Line 146:
*Silicon (oxy)nitride: ~0.02-? µm/min
*Silicon (oxy)nitride: ~0.02-? µm/min
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===Definition of structures===
===Definition of structures===
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