Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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| | |[[media:AZ_MiR_701.pdf|AZ_MiR_701.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||
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Revision as of 08:54, 12 August 2013
| Process | Resist Type | Comment 1 | Comment 2 | Comment 3 |
|---|---|---|---|---|
| Lift off | NLOF | AA | BB | CC |
| Dry Etch | DD
|
EE | FF | GG |
| Wet Etch | HH
|
II | JJ | KK |
| Resist | Comments | Pre-treatment | Resist Coating | Exposure | Baking | Developing | Stripping, Lift-off |
|---|---|---|---|---|---|---|---|
| AA | AA | AA | AA | AA | AA | AA | AA |
| BB | BB | BB | BB | BB | BB | BB | BB |
| CC | CC | CC | CC | CC | CC | CC | CC |
Resist Overview
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| AZ5214E | Positive | AZ5214E.pdf | SSE, KS Spinner |
| |||||
| AZ4562 | Positive | AZ4500.pdf | SSE, KS Spinner | ||||||
| AZ MiR 701 | Positive | AZ_MiR_701.pdf | Spin Track 1 + 2 | ||||||
| AZ nLOF 2020 | Negative | Spin Track 1 + 2 |
| ||||||
| SU8 | Positive | KS Spinner |
|