Specific Process Knowledge/Lithography/Strip: Difference between revisions
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A typical process time for stripping of 1.5 µm AZ5214e resist is 15-25 min and for stripping of 9.5 µm AZ4562 resist is 20-35 min with the process parameters: 210ml O<math>_2</math>/min or mixture of 210ml O<math>_2</math>/min and 70ml N<math>_2</math>/min, power 1000W. | A typical process time for stripping of 1.5 µm AZ5214e resist is 15-25 min and for stripping of 9.5 µm AZ4562 resist is 20-35 min with the process parameters: 210ml O<math>_2</math>/min or mixture of 210ml O<math>_2</math>/min and 70ml N<math>_2</math>/min, power 1000W. | ||
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The other materials have not been tested yet. | The other materials have not been tested yet. | ||
=III-V Plasma Asher = | |||
=Rough Acetone Strip= | =Rough Acetone Strip= | ||