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| *Rinse your wafers for 4-5 min. in running water after stripping . | | *Rinse your wafers for 4-5 min. in running water after stripping . |
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| =Lift-off wet bench=
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| [[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]]
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| This bench is only for wafers with metal!
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| Here are the main rules for lift-off bench use:
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| *Place the wafers in a dedicated wafer holder.
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| *Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.
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| *Rinse your wafers for 4-5 min. in running water after stripping.
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| Find more info about the lift-off process here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]]
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