Specific Process Knowledge/Lithography/Strip: Difference between revisions

@@ Line 25: / Line 25: @@
 |style="background:LightGrey; color:black"|Minimum feature size
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-*1.25µm down to 1.0µm
+*
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-*1.25µm
+*
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 |style="background:LightGrey; color:black"|Exposure light/filters/spectrum
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-* 350W Hg-lamp, 365nm filter, 303nm filter optional
+*
-* intensity in Constant Intensity(CI) mode 7mJ/cm2
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-* 350W Hg-lamp, SU8 filter, 365nm filter optional
+*
-* intensity in Constant Intensity(CI) mode 7mJ/cm2
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 |style="background:LightGrey; color:black"|Exposure mode
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-*proximity, soft, hard, vacuum contact
+*
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-*proximity, soft, hard, vacuum contact
+*
-*proximity, soft, hard, vacuum contact
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 *