Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
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Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. | Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. | ||
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===A rough overview of the performance of the Ellipsometer=== | |||
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!style="background:silver; color:black;" align="left"|Purpose | |||
|style="background:LightGrey; color:black"|Film thickness measurements and optical characterization of optically transparent thin films||style="background:WhiteSmoke; color:black"| | |||
*Measurement of (multi layer) film thickness (only one unknown layer) | |||
*Optical constants | |||
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!style="background:silver; color:black" align="left"|Performance | |||
|style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"| | |||
Any film that is transparent to the light in the given wavelength range | |||
ex: | |||
*Silicon Oxide | |||
*Silicon nitride | |||
*PolySilicon (on oxide) | |||
*Photoresists | |||
*SU8 | |||
*Other polymers | |||
*Very thin layers of metals (<20 nm) | |||
*and many more | |||
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Film thickness range | |||
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*~10Å to 2 µm (depending of the material) | |||
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!style="background:silver; color:black" align="left"|Process parameter range | |||
|style="background:LightGrey; color:black"|Wavelength range | |||
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*350-950 nm | |||
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!style="background:silver; color:black" align="left"|Substrates | |||
|style="background:LightGrey; color:black"|Batch size | |||
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*One sample at a time - all sample larger than about 1x1 cm<sup>2</sup>sizes up to about 6" | |||
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed | |||
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*In principle all materials | |||
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