Specific Process Knowledge/Lithography: Difference between revisions
| Line 37: | Line 37: | ||
|Generel description - method 1 | |Generel description - method 1 | ||
|Generel description - method 2 | |Generel description - method 2 | ||
| | |Electron beam lithography | ||
|4 | |4 | ||
|5 | |5 | ||
| Line 52: | Line 50: | ||
*~200nm and up | *~200nm and up | ||
| | | | ||
*~ | *~12nm - 1 µm | ||
| | | | ||
*~20nm and up | *~20nm and up | ||