Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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Alternatively, a [http://en.wikipedia.org/wiki/Proximity_effect_%28electron_beam_lithography%29 point-spread function] can be used in BEAMER to calculate the optimised dose-variation. | Alternatively, a [http://en.wikipedia.org/wiki/Proximity_effect_%28electron_beam_lithography%29 point-spread function] can be used in BEAMER to calculate the optimised dose-variation. | ||
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== Trilayer resist stack == | == Trilayer resist stack == | ||