Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 |style="background:WhiteSmoke; color:black"|
-*Spinning and baking of AZ5214E resist
+*Coating and baking of
-*Spinning and baking of AZ4562 resist
+**AZ5214E resist
-*Spinning and baking of e-beam resist
+**AZ4562 resist
+**E-beam resist
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-*Spinning and baking of AZ5214E resist
+*Coating baking of
-*Spinning and baking of AZ4562 resist
+**AZ5214E resist
-*Spinning and baking of SU8 resist
+**AZ4562 resist
+**SU8 resist
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 *In-line substrate HMDS priming
-*Coating and baking of AZ MiR 701 (29cps) resist
+*Coating and baking of
-*Coating and baking of AZ nLOF 2020 resist
+**AZ MiR 701 (29cps) resist
+**AZ nLOF 2020 resist
 *Post-exposure baking at 110°C
 |