Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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*2 syringe lines, which can be used for spinning of e-beam resist. | *2 syringe lines, which can be used for spinning of e-beam resist. | ||
The user manual | '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=188 LabManager]''' | ||
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