Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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| style="background:LightGrey; color:black"|Substrate material allowed | | style="background:LightGrey; color:black"|Substrate material allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Silicon | *Silicon, quartz, pyrex, III-V materials | ||
*Wafers with layers of silicon oxide or silicon (oxy)nitride | *Wafers with layers of silicon oxide or silicon (oxy)nitride | ||
*Wafers with layers of metal | *Wafers with layers of metal | ||
|} | |} | ||