Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team at [mailto:e-beam@danchip.dtu.dk]. | On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team at [mailto:e-beam@danchip.dtu.dk]. | ||
= E-beam resists and Process Flows | = E-beam resists and Process Flows = | ||
<span style="font-size: 60%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|top of this page]]</span> | |||
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