Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
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==Filmtek 4000== | ==Filmtek 4000== | ||
[[image:Filmtek.JPG|300x300px|right|thumb|FilmTek 4000: positioned in cleanroom 2]] | [[image:Filmtek.JPG|300x300px|right|thumb|FilmTek 4000: positioned in cleanroom 2]] | ||
FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient | |||
Normal incidence and polarized 70 degree reflection data is collected and used to calculate thickness and index of refraction of the measured film using SCI’s patented Differential Power Spectral Density (DPSD) technique. Absolute reflection data is obtained by comparing sample data to the measured reflection of a known reference sample, typically a silicon wafer with a thermally grown thin oxide (~63 nm) film. | |||
The spectrophotometer scans the sample over a predefined range of wavelengths. The software generates a reflection spectrum based on a previously stored reference scan, and then performs a regression on the unknown parameters to fit the simulated reflection and power spectral density to the observed values. The resulting thin film parameters along with the measured and modeled spectra are then displayed for the user to examine. | |||
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