Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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[[Image:ebeam.jpg|300x300px|thumb|]] | [[Image:ebeam.jpg|300x300px|thumb|]] | ||
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The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The minimum electron beam is around 12 nm, the maximum writitng field without stitching is 1 mm x 1 mm. | The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The minimum electron beam is around 12 nm, the maximum writitng field without stitching is 1 mm x 1 mm. | ||