Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== ESPACER == | == ESPACER == | ||
We have ESPACER in stock and approved for use in the cleanroom but have not yet had the chance to investigate the material. | We have ESPACER in stock and approved for use in the cleanroom but have not yet had the chance to investigate the material. You can find a guideline for a process flow here: [[media:Process_Flow_ZEP_ESPACER.docx|Process_Flow_ZEP_ESPACER.docx]]. Technical information of EPSCAER can be found here: [[media:Espacer_300_Technical_Info.pdf|Espacer_300_Technical_Info.pdf]], [[media:Espacer_catalog.pdf|Espacer_catalog.pdf]]. | ||
[ | Please contact [mailto:lithography@danchip.dtu.dk Lithography] if you wish to test this material. | ||