Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 118: | Line 118: | ||
|Positive | |Positive | ||
|ZEON | |ZEON | ||
|Standard | |Standard positive resist | ||
|[[media:ZEP520A.pdf|ZEP520A.pdf]] | |[[media:ZEP520A.pdf|ZEP520A.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||